发明名称 Bipolar transistor and manufacturing method therefor
摘要 A bipolar transistor has a first conductivity type semiconductor substrate (1), a first conductivity type collector layer (2) with an impurity concentration lower than that of the semiconductor substrate (1), which is formed on the semiconductor substrate (1), a second conductivity type base layer (3) formed on the collector layer (2), a first conductivity type emitter layer (4) formed on the base layer (3), and a conductive film (8) covering the side faces of the collector layer (2) and the base layer (3). Since the conductive film (8) covering the side faces of the collector layer (2) and the base layer (3) is provided, the electric field concentration near the side faces of the collector layer (2) and the base layer (3) is relaxed, so that the withstand voltage of transistor can be increased. Also, the thickness of the collector layer (2) is decreased, so that the current amplification factor can be enhanced.
申请公布号 US2003030126(A1) 申请公布日期 2003.02.13
申请号 US20010995576 申请日期 2001.11.29
申请人 MITSUBISHI HEAVY INDUSTRIES, LTD. 发明人 HIROSE FUMIHIKO
分类号 H01L21/331;H01L29/73;H01L29/732;(IPC1-7):H01L27/082 主分类号 H01L21/331
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