发明名称 GUIDANCE METHOD AND APPARATUS FOR CONTROLLING OXYGEN CONCENTRATION IN SILICON CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a guidance method and an apparatus for controlling oxygen concentration in a silicon single crystal when pulling up the crystal from molten silicon liquid by the CZ method. SOLUTION: The oxygen concentration in the crystal is controlled by controlling crucible revolution, flow rate of inert gas, intra-furnace pressure, and molten liquid level, etc., when pulling up the single crystal. The reliability on applying profile of operation to real device, i.e., by self estimation of reliability of the guidance, the guidance of operational profile and reliability or evaluation of reliability is presented.
申请公布号 JP2003040693(A) 申请公布日期 2003.02.13
申请号 JP20010227031 申请日期 2001.07.27
申请人 SUMITOMO MITSUBISHI SILICON CORP 发明人 NAKAGAWA SHIGEMASA;TABUCHI MASATO;NAKAJIMA KATSUNORI
分类号 C30B29/06;(IPC1-7):C30B29/06 主分类号 C30B29/06
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