| 摘要 |
A system and method is provided for applying a developer to a photoresist layer (42, 62) disposed on a substrate (44, 64). The developer system and method employ a developer plate (41, 61) having a plurality of apertures (47, 67) for dispensing developer. The developer plate (41, 61) is disposed above the substrate (44, 64) and substantially and/or completely surrounds the top surface of the substrate (44, 64) during application of the developer. A small gap (50, 69) is formed between the substrate (44, 64) and the bottom surface of the developer plate (41, 61). The substrate (44, 64) and the developer plate (41, 61) form a parallel plate pair, such, that the gap (50, 69) can be made small enough so that the developer fluid quickly fills the gap (50, 69). A differential voltage is applied to the developer plate (41, 61) and the substrate (44, 64) causing an electric field (118) to be formed in the gap (50, 69), which facilitates transportation of negatively charged photoresist material during the development process. |
