发明名称 WAFER PROCESSING SYSTEM INCLUDING A ROBOT
摘要 A wafer processing system occupies minimal floor space by using vertically mounted modules such as reactors, load locks, and cooling stations. Further saving in floor space is achieved by using a loading station which employs rotational motion to move a wafer carrier into a load lock. The wafer processing system includes a robot having extension, rotational, and vertical motion for accessing vertically mounted modules. The robot is internally cooled and has a heat resistant end-effector, making the robot compatible with high temperature semiconductor processing.
申请公布号 WO03012830(A1) 申请公布日期 2003.02.13
申请号 WO2000US32655 申请日期 2000.12.01
申请人 WAFERMASTERS, INCORPORATED;TOKYO ELECTRON LIMITED 发明人 KURIBAYASHI, HIROMITSU;YOO, WOO, SIK
分类号 B25J9/06;B65G49/07;H01L21/00;H01L21/02;H01L21/677;(IPC1-7):H01L21/00 主分类号 B25J9/06
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