发明名称 |
WAFER PROCESSING SYSTEM INCLUDING A ROBOT |
摘要 |
A wafer processing system occupies minimal floor space by using vertically mounted modules such as reactors, load locks, and cooling stations. Further saving in floor space is achieved by using a loading station which employs rotational motion to move a wafer carrier into a load lock. The wafer processing system includes a robot having extension, rotational, and vertical motion for accessing vertically mounted modules. The robot is internally cooled and has a heat resistant end-effector, making the robot compatible with high temperature semiconductor processing. |
申请公布号 |
WO03012830(A1) |
申请公布日期 |
2003.02.13 |
申请号 |
WO2000US32655 |
申请日期 |
2000.12.01 |
申请人 |
WAFERMASTERS, INCORPORATED;TOKYO ELECTRON LIMITED |
发明人 |
KURIBAYASHI, HIROMITSU;YOO, WOO, SIK |
分类号 |
B25J9/06;B65G49/07;H01L21/00;H01L21/02;H01L21/677;(IPC1-7):H01L21/00 |
主分类号 |
B25J9/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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