| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma trap in a plasma apparatus, which prevents plasma from generating at an area other than a plasma generating part, or prevents plasma seeds from flowing out to a reaction chamber, and which generates little pressure loss of gas flow, can pass a large amount of gas, has superior thermal impact resistance, can be easily maintained due to capability of lightweighting and miniaturization, and hence improve availability factor of the apparatus. SOLUTION: The plasma trap arranged at least either of a gas inlet or a gas outlet of the reaction chamber in the plasma apparatus, is comprised of porous ceramics having consecutive spherical open pores 2 consisting of several adjacent pores, which are three-dimensionally communicated with each other through a part of a skeleton wall 1 of partitioning the pores, and by having porosity of 40% or more but 90% or less.
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