发明名称 Chamber cleaning via rapid thermal process during a cleaning period
摘要 A method for cleaning a process chamber, comprising the steps of introducing at least one cleaning gas to the process chamber; and employing a rapid heating module located in the process chamber, wherein the rapid heating module increases the temperature of chamber parts and improves the surface temperature uniformity of chamber parts when the module is turned on, thereby assisting the cleaning activity of the cleaning gas such that the process chamber is cleaned.
申请公布号 US2003029473(A1) 申请公布日期 2003.02.13
申请号 US20010866225 申请日期 2001.05.24
申请人 APPLIED MATERIALS, INC. 发明人 SUN SHENG
分类号 B08B7/00;C23C16/44;(IPC1-7):B08B6/00 主分类号 B08B7/00
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