发明名称 Wafer holding plate for wafer grinding apparatus and method for manufacturing the same
摘要 <p>A wafer holding plate for a wafer grinding apparatus. The plate includes a substrate (B1) having a wafer adhering surface (6a) to which a semiconductor wafer is adhered by an adhesive. The wafer adhering surface includes a mirror-like surface portion and a groove pattern (10), which anchors the adhesive. When the plate is used for grinding wafers, the quality and accuracy of the finished wafers is greatly improved.</p>
申请公布号 EP1283089(A2) 申请公布日期 2003.02.12
申请号 EP20020021015 申请日期 2000.03.21
申请人 IBIDEN CO., LTD. 发明人 JIMBO, NAOYUKI;OKUDA, YUJI;ISHIKAWA, SHIGEHARU;MISHIMA, ATSUSHI
分类号 B24B1/00;B24B7/22;B24B37/30;B24C1/04;B24C3/32;H01L21/463;(IPC1-7):B24B37/04;B24B41/06 主分类号 B24B1/00
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