发明名称 PLASMA PROCESSING APPARATUS
摘要 A first conductive plate (31A) constituting the radiation surface of a slot antenna (30A) inclines with respect to a first dielectric member (13) opposed to the radiation surface of the slot antenna (30A). Consequently, a plasma generated by the electric field of an electromagnetic field entering directly from the slot antenna (30A) can be set dominant over a plasma generated by the electric field of a standing wave formed in a processing vessel (11). Since the former can be controlled more easily than the latter, the plasma distribution can be improved. <IMAGE>
申请公布号 KR20030012937(A) 申请公布日期 2003.02.12
申请号 KR20037000345 申请日期 2003.01.10
申请人 发明人
分类号 H01L21/3065;H05H1/46;B01J19/08;C23C16/24;C23C16/511;H01J37/32;H01L21/205;H01L21/302 主分类号 H01L21/3065
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