发明名称 |
Solid state imaging pickup device and method for manufacturing the same |
摘要 |
A solid state imaging pickup device with a single-layer electrode structure which eliminates the release area at the terminal part of the charge transfer electrodes by surrounding the charge transfer electrodes with a dummy pattern, or with a pattern formed by connecting the charge transfer electrodes of a certain phase with each other at the outermost periphery. Surrounding the charge transfer electrode improves embedding performance when an insulating film is re-flowed for flattening inter-electrode gaps. This enables formation of a good metal wire or shielding film with no step-cut, thus improving the reliability of a solid state imaging pickup device.
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申请公布号 |
US6518605(B1) |
申请公布日期 |
2003.02.11 |
申请号 |
US20010770188 |
申请日期 |
2001.01.29 |
申请人 |
NEC CORPORATION |
发明人 |
HATANO KEISUKE;FURUMIYA MASAYUKI;KAWASAKI TORU |
分类号 |
H01L29/762;H01L21/339;H01L27/146;H01L27/148;H04N5/335;H04N5/341;H04N5/369;H04N5/372;(IPC1-7):H01L29/768 |
主分类号 |
H01L29/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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