| 摘要 |
The invention is about a process for depositing via the sol-gel route a continuous or discontinuous layer based on metal oxide(s) on a substrate (1), especially a transparent substrate, which includes at least the following steps:(a)-preparation of a sol from at least one metal precursor, at least one chelating/stabilizing agent, optionally at least one solvent and/or at least one dopant precursor,(b)-deposition of the sol as a layer on at least part of one of the faces of the substrate (1),(c)-irradiation by ultraviolet rays of at least part of the sol deposited as a layer on the substrate (1),(d)-heat treatment of at least that part of the sol which was irradiated by the ultraviolet rays.
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