| 摘要 |
<p>PROBLEM TO BE SOLVED: To quickly and automatically detect a high precision target pattern based on reference coordinates of alignment by setting the reference coordinates for alignment in a region near the target pattern in the device-forming region. SOLUTION: A pattern, in which the gravity position does not change even if deformations are generated due to the approximity effect of pattern and coarse density, is selected at pattern formation as an alignment pattern from the areas near to the target pattern, and its center of gravity position is set to the reference coordinates of alignment (S12). The alignment pattern in the device-forming region is detected through rough alignment based on the reference position provided in the external side of the device-forming region (S15). Alignment is conducted to attain matching between the reference coordinates of alignment for alignment pattern and the center coordinates of the target pattern (S16), to thereby detect the target pattern (S17).</p> |
