发明名称 METHOD OF MANUFACTURING X-RAY MASK
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of manufacturing an X-ray mask which enables to accurately manufacture an absorber pattern of an X-ray mask. SOLUTION: The method of manufacturing an X-ray mask 27a comprises a process of forming an X-ray absorber on a substrate and a process of controlling the stress of the X-ray absorber under prescribed conditions. The conditions for controlling the stress of the X-ray absorber 4 formed on the substrate 1 are determined by the measured value of the stress of the X-ray absorber formed on the monitor substrate 1. The correct stress of the X-ray absorber 4 of the X-ray mask in the processes can be known in this way, and from the information on the correct stress, the stress of the X-ray absorber 4 can be lowered, resulting in the creation of a highly accurate X-ray mask.</p>
申请公布号 JP2003037058(A) 申请公布日期 2003.02.07
申请号 JP20020166914 申请日期 2002.06.07
申请人 MITSUBISHI ELECTRIC CORP 发明人 YABE HIDETAKA;MARUMOTO KENJI;KICHISE KOJI;AYA ATSUSHI;MATSUI YASUTSUGU;SASAKI KEI
分类号 G03F1/22;G03F1/40;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/22
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