摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method of manufacturing an X-ray mask which enables to accurately manufacture an absorber pattern of an X-ray mask. SOLUTION: The method of manufacturing an X-ray mask 27a comprises a process of forming an X-ray absorber on a substrate and a process of controlling the stress of the X-ray absorber under prescribed conditions. The conditions for controlling the stress of the X-ray absorber 4 formed on the substrate 1 are determined by the measured value of the stress of the X-ray absorber formed on the monitor substrate 1. The correct stress of the X-ray absorber 4 of the X-ray mask in the processes can be known in this way, and from the information on the correct stress, the stress of the X-ray absorber 4 can be lowered, resulting in the creation of a highly accurate X-ray mask.</p> |