发明名称 SEMICONDUCTOR PROCESSING APPARATUS
摘要 <p>PURPOSE: A semiconductor processing apparatus is provided to prevent a substrate from dropping when it is transferred/received to/from a separating apparatus by installing a member in a separation unit while a shutter is open and by separating the member while the shutter is closed. CONSTITUTION: A chamber is prepared. The separation unit is so disposed to separate the member by using a flow of liquid, positioned in the chamber. The shutter is installed in the chamber. A robot is so disposed to install the member in the separation unit. The robot installs the member in the separation unit while the shutter is open. The separation unit separates the member while the shutter is closed.</p>
申请公布号 KR20030011267(A) 申请公布日期 2003.02.07
申请号 KR20020086991 申请日期 2002.12.30
申请人 CANON KABUSHIKI KAISHA 发明人 MIYAKOGAWA TOSHIKAZU;OMI KAZUAKI;SAKAGUCHI KIYOFUMI;YANAGITA KAZUTAKA;YANEHARA TAKAO
分类号 H01L21/68;H01L21/00;H01L21/762;(IPC1-7):H01L21/68 主分类号 H01L21/68
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