发明名称 Thin film semiconductor device having arrayed configuration of semiconductor crystals and a method for producing it
摘要 A thin film semiconductor device and a method for producing it are described. In the thin film layer of semiconductor of the device, a plurality of large size single-crystalline grains of semiconductor are formed in a regulated configuration, and each of single crystalline grains is equipped with one unit of electric circuit having a gate electrode, a source electrode and drain electrode. Such regulated arrangement of large size single-crystalline grains in the semiconductor layer is realized by a process including a step of irradiating the layer of amorphous or polycrystalline semiconductor with energy beam such as excimer laser so that maximum irradiation intensity points and minimum irradiation intensity points are arranged regulatedly. The device can have a high mobility such as about 500 cm2/V sec..
申请公布号 US2003027410(A1) 申请公布日期 2003.02.06
申请号 US20020192850 申请日期 2002.07.11
申请人 ALTEDEC 发明人 MATSUMURA MASAKIYO;OANA YASUHISA;ABE HIROYUKI;YAMAMOTO YOSHITAKA;KOSEKI HIDEO;WARABISAKO MITSUNORI
分类号 H01L21/20;H01L21/336;H01L21/84;H01L29/786;(IPC1-7):H01L21/20;H01L21/36;C30B1/00;H01L21/00 主分类号 H01L21/20
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