Method and apparatus for recovery of semiconductor wafers from a chemical tank

摘要

A method for stopping chemical processing of a semiconductor wafer in an emergency included the steps of: 1) placing a chemical having a water concentration of about 92% or less in a tank; 2) processing a semiconductor wafer with the chemical in the process tank; 3) detecting a malfunction in the processing; 4) quick draining the chemical from the process tank; and 5) rinsing the wafer in the process tank with a rinsing material to stop chemical action. Optionally, the method may include recycling the drained chemical from a storage tank to the process tank for use in a subsequent process step. Also, a chemical processing system includes: 1) a process tank adapted to processing semiconductor wafers in a chemical having a water concentration of about 92% or less; 2) a control system adapted to detecting a malfunction in processing; 3) a drain valve adapted to quick draining the chemical in the process tank; 4) a storage tank adapted to storing the quick drained chemical; 5) a spray bar adapted to applying a rinsing material to the wafers in the process tank; and 6) a recycling mechanism adapted to returning the quick drained chemical to the process tank.