| 摘要 |
A semiconductor device comprising a memory cell, which memory cell comprises:a write transistor (TWR)a read transistor (TRE),a sense transistor (TSE) provided with a sense transistor gate, a first sense transistor electrode (7) and a second sense transistor electrode (3), the first sense transistor electrode (7) being connected to a read transistor electrode (9), the sense transistor gate being arranged as a floating gate (FG), said floating gate being separated from the second sense electrode (3) by a sense transistor oxide layer (THINOX) and from a write transistor electrode (1) by a tunnel oxide layer (TUNOX);a voltage source arrangement (5, Vsi_p, Vsi_e) to provide the second sense transistor electrode (3) with a predetermined voltage during programming and erasing, such that no stress induced leakage current occurs in the sense transistor oxide layer (THINOX).
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