DRAWING DATA, CREATING METHOD AND APPARATUS THEREOF, DRAWING METHOD, MASK AND ITS CREATION METHOD, SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD, PROGRAM FOR DRAWING DATA CREATION, AND COMPUTER READABLE RECORD MEDIUM WITH RECORDED PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a creating method and apparatus of drawing data for making short the movement distance of a stage that moves in a field unit in pattern drawing due to an electron beam, drawing data, a drawing method, a mask and its manufacturing method, a semiconductor device and its manufacturing method, a program for drawing data creation, and a computer readable record medium where the program is recorded. SOLUTION: A plurality of pattern data P1 to P7B divided into a plurality of pattern data files PF1 to PF7 are synthesized to one pattern data PX for changing into one file, fields Fa to Ft are set in a lattice again to the synthesized pattern data PX, and a stage 2 sets drawing order for the fields Fa to Ft set again so that merely a field where a pattern to be drawn exists is selected and at the same time continuous movement between adjacent fields is made, thus creating the drawing data.