发明名称 Illumination apparatus, exposure apparatus using the same and device fabrication method
摘要 An illumination apparatus for using a beam emitted from a light source to illuminate an object area includes a condensing optical system for condensing the beam emitted from the light source, and a reflection type optical integrator located between the condensing optical system and the object area, the optical integrator having an m-gonal (where m is an even number) sectional shape, forming multiple pairs of opposing reflection surfaces, and reflecting the beam between the multiple pairs of opposing reflection surfaces, wherein a length L in an axial direction of the reflection type optical integrator meets the following equations: R=PHI/[tan {sin-1(sin theta/n)}]; and Cx(A-0.1)xR<=L<=Cx(A+0.1) X R, where n is a refractive index of a medium between the reflection surfaces, PHI is a distance between the reflection surfaces, theta is an angle of divergence when the beam emitted from the condensing optical system enters the reflection type optical integrator, C is a constant determined in relation to the sectional shape of the reflection type optical integrator, and A is a natural number.
申请公布号 US2003021579(A1) 申请公布日期 2003.01.30
申请号 US20020142498 申请日期 2002.05.10
申请人 SHINODA KENICHIRO 发明人 SHINODA KENICHIRO
分类号 G02B6/42;G02B27/00;G02F1/13357;(IPC1-7):G02B6/00;F21V8/00 主分类号 G02B6/42
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