发明名称 Microwave Plasma Generating Plasma and Plasma Torches
摘要 The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supply in the vicinity of the dielectric substrate on a side opposite to that bearing the conductor. The invention also relates to plasma torches using said device.
申请公布号 US2012018410(A1) 申请公布日期 2012.01.26
申请号 US20080679231 申请日期 2008.09.16
申请人 ZAKRZEWSKI ZENON;MOISAN MICHEL;GUERIN DANIEL;ROSTAING JEAN-CHRISTOPHE;L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L "EXPLOITATION DES PROCEDES GEORGES CLAUDE 发明人 ZAKRZEWSKI ZENON;MOISAN MICHEL;GUERIN DANIEL;ROSTAING JEAN-CHRISTOPHE
分类号 B23K9/00;H05H1/46 主分类号 B23K9/00
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