| 摘要 |
<p>An ITO sintered body sputtering target characterized by containing 20 to 50 wt% of tin oxide and its manufacturing method. The ITO sintered body sputtering target is useful to form a high-resistance transparent conductive film, especially a transparent conductive film used for determining a position on the screen of, e.g., a resistance-film touch-panel device and having a high surface resistivity of 300 to 1000 Ω/&square;.</p> |
