| 摘要 |
PROBLEM TO BE SOLVED: To improve vacuum treatment characteristic, to perform the vacuum treatment of a work, in particular, a work of a large area in a very uniform manner, and to reduce the vacuum treatment cost. SOLUTION: A vacuum treatment device 300 comprises a base body supporter 306 for installing a cylindrical base body 301 in a reaction vessel 302, a gas pipe 303 for introducing a raw gas in the reaction vessel 302, and an exhaust pipe 307 for exhausting the reaction vessel 302. The vacuum treatment device 300 further comprises a high-frequency power introducing means comprising a plurality of high-frequency power sources 308 and 317 for feeding the high-frequency power of the frequencies different from each other, a plurality of high-frequency electrodes 304 for introducing the high-frequency power fed from the high-frequency power sources 308 and 317 in a reaction space of the vessel 302, and a power branching plate 313 in which the high-frequency power respectively fed from the high-frequency power sources 308 and 317 is introduced in a synthesized manner, and the synthesized high-frequency power is respectively distributed. The power branching plate 313 is formed in a flat plate-like shape.
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