| 摘要 |
PURPOSE: A magnetron apparatus for coating a magnetic material is provided to improve use efficiency and deposition rate of a target by minimizing absorption of a magnetic field emitted from a magnetic part into a target, a magnetic material, thereby increasing density and intensity of the magnetic field emitted onto the target surface. CONSTITUTION: In a magnetron apparatus in which magnets(13,14) and an insulator(16) are interposed between a support plate(11) and a shield plate(12), and which coats a magnetic material on a target by producing a magnetic field, the magnetron apparatus for coating the magnetic material comprises a target(10) which is stationed on the support plate(11) by being formed of a magnetic pure metal or magnetic compound, and in which central part(10a) and edge part(10c) of the target(10) that are an emission part of the magnetic field are removed, and a vent hole(10b) is formed at the surroundings of the central part(10a); an anode plate(17) which is electrically formed as the anode to induce migration of electrons onto the surface of the target(10) and prevents migration of impurities into a thin film due to discharge at the support plate(11); and a gas injector(18) which is connected to a metal pipe(19) inserted into the vent hole(10b) of the target(10) to supply discharge gas such as Ar.
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