发明名称 Schottky barrier diode and manufacturing method of schottky barrier diode
摘要 <p>A Schottky barrier diode has a Schottky electrode (11) formed on an operation region of a GaAs substrate (1) and an ohmic electrode (8) surrounding the Schottky electrode (11). The ohmic electrode (8) is disposed directly on an impurity-implanted region (7) formed on the substrate (1). A nitride film (5) insulates the ohmic electrode (8) from a wiring layer connected to the Schottky electrode (11) crossing over the ohmic electrode (8). The planar configuration of this device does not include the conventional polyimide layer, and thus has a better high frequency characteristics than conventional devices. &lt;IMAGE&gt;</p>
申请公布号 EP1280210(A2) 申请公布日期 2003.01.29
申请号 EP20020017079 申请日期 2002.07.29
申请人 SANYO ELECTRIC CO., LTD. 发明人 ASANO, TETSURO;ONODA, KATSUAKI;NAKAJIMA, YOSHIBUMI;MURAI, SHIGEYUKI;TOMINAGA, HISAAKI;HIRATA, KOICHI;SAKAKIBARA, MIKITO;ISHIHARA, HIDETOSHI
分类号 H01L21/329;H01L29/872;(IPC1-7):H01L29/872 主分类号 H01L21/329
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