发明名称 |
PLASMA ENHANCED CVD SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To provide a plasma enhanced CVD system with which the observation over the entire part of a plasma state is possible and the uniformity by the film thickness and film quality can be promptly discriminated from the distribution state of the plasma. SOLUTION: This plasma enhanced CVD system comprises a cathode 21 of a hollow cylindrical shape on one side and a rod-shaped anode 12 in this cylinder on the other and having a circuit for impressing a high-frequency voltage between both electrodes 21 and 12, in which the flank of the cathode 21 of the hollow cylindrical shape is provided with a slit 23 which is perpendicular to its top surface 21a and is longitudinally long within a range from 3 to 10 mm in width W. |
申请公布号 |
JP2003027247(A) |
申请公布日期 |
2003.01.29 |
申请号 |
JP20010219760 |
申请日期 |
2001.07.19 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
YAMAMOTO KYOICHI;TAKEDA AKIRA;SHIRAI TSUTOMU |
分类号 |
H05H1/46;B01J19/08;C23C16/509 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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