发明名称 PLASMA ENHANCED CVD SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a plasma enhanced CVD system with which the observation over the entire part of a plasma state is possible and the uniformity by the film thickness and film quality can be promptly discriminated from the distribution state of the plasma. SOLUTION: This plasma enhanced CVD system comprises a cathode 21 of a hollow cylindrical shape on one side and a rod-shaped anode 12 in this cylinder on the other and having a circuit for impressing a high-frequency voltage between both electrodes 21 and 12, in which the flank of the cathode 21 of the hollow cylindrical shape is provided with a slit 23 which is perpendicular to its top surface 21a and is longitudinally long within a range from 3 to 10 mm in width W.
申请公布号 JP2003027247(A) 申请公布日期 2003.01.29
申请号 JP20010219760 申请日期 2001.07.19
申请人 TOPPAN PRINTING CO LTD 发明人 YAMAMOTO KYOICHI;TAKEDA AKIRA;SHIRAI TSUTOMU
分类号 H05H1/46;B01J19/08;C23C16/509 主分类号 H05H1/46
代理机构 代理人
主权项
地址