SEMICONDUCTOR FABRICATION APPARATUS HAVING MULTI-HOLE ANGLED GAS INJECTION SYSTEM

摘要

PURPOSE: A semiconductor fabrication apparatus having a multi-hole angled gas injection system is provided to inject uniformly gases within a reaction chamber by forming the multi-hole angled gas injection system on a wall of a process chamber without adhering an additional gas injector. CONSTITUTION: An outer ring-shaped path(161) and an inner ring-shaped path(171) are formed along a sidewall of a process chamber(110). The outer ring-shaped path(161) and the inner ring-shaped path(171) are connected to each other by using a connection path(165). The outer ring-shaped path(161) is connected with the outside of the process chamber(110) through a gas supply tube(131). The inner ring-shaped path(171) is connected with the inside of the reaction chamber(110) through a plurality of gas injection tubes(181). A plurality of gas injection holes(191) are arranged along an inner wall of the process chamber(110).