| 摘要 |
A display unit (22) displays a shot map, and an operator designates an evaluation point on the shot map. A exposure control unit (21) computes the position coordinates on a projection area (on a plate) corresponding to the designated evaluation point, and outputs the result to the display unit (22). When an overlapping portion is detected in a pattern exposed onto the substrate (6), and an evaluation point is designated on the overlapping portion, the exposure control unit (21) outputs corresponding pattern candidates, and the operator can select a desired pattern from among the candidates. Furthermore, when one point is designated on a shot map, two points containing a pattern boundary are automatically indicated as evaluation points. Thus, an evaluation point can be designated, and the position on the plate can be correctly obtained within a short time, thereby improving the operation efficiency of the apparatus.
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