发明名称 ACTIVE MATRIX SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PROBLEM TO BE SOLVED: To provide an active matrix substrate in which the height of an active matrix from the substrate face where the element is to be transferred can be controlled when the active matrix element is transferred so that the active matrix element and the substrate where the element is transferred and aligned to almost parallel to each other even when an adhesive layer is applied between these, and a method for manufacturing the same. SOLUTION: The active matrix substrate has a substrate 401, a plurality of adhesive layers formed to substantially equal height to one another on the substrate 401, and a plurality of active elements 301 disposed on each of the adhesive layers. Each adhesive layer contains a height controlling member 402 and an adhesive 403.</p>
申请公布号 JP2003022033(A) 申请公布日期 2003.01.24
申请号 JP20010208723 申请日期 2001.07.10
申请人 TOSHIBA CORP 发明人 AKIYAMA MASAHIKO;HARA YUJIRO;ONOZUKA YUTAKA;HIOKI TAKESHI;NAKAJIMA MITSUO
分类号 G02F1/1368;G02F1/1333;G02F1/1339;G02F1/136;G09F9/00;G09F9/30;G09F9/35;H01L21/02;H01L21/336;H01L21/77;H01L21/84;H01L23/495;H01L27/12;H01L27/32;H01L29/786;(IPC1-7):G09F9/30 主分类号 G02F1/1368
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