| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material having a high contrast in alkali dissolution rate before and after exposure, having high sensitivity and high resolution and exhibiting superior etching resistance by adding a high molecular compound obtained by copolymerizing a norbornadiene carboxylate substitution product having an acid labile group and an indene substitution product as a base resin to a resist material. SOLUTION: The resist material contains a high molecular compound having repeating units of formula (1) (where R<1> and R<2> are each H, hydroxy, alkyl, substitutable alkoxy or halogen; R<3> is an acid labile group; (m) is 0 or a positive integer of 1-4; and (p) and (q) are each a positive number) and having a weight average molecular weight of 1,000-500,000. |
