SHOWER HEAD OF WAFER PROCESSING APPARATUS HAVING INTERVAL CONTROL DEVICE

摘要

PURPOSE: A shower head of a wafer processing apparatus having an interval control device is provided to control the amount of reaction gas by installing the interval control device between two baffle plates. CONSTITUTION: A top plate(10) has a gas inflow hole(12) for transferring a reaction gas into a process chamber. A face plate(20) faces a process region of the process chamber. A plurality of through-holes are formed in the face plate(20). The first baffle plate(30) and the second baffle plate(40) are installed between the top plate(10) and the face plate(20). An interval control device is formed on an upper face of the first baffle plate(30). The interval control device is formed with the first spacer ring(92). An interval control device including the second spacer ring(94) is formed between the first and the second baffle plate(30,40). The positions of the first and the second baffle plate(30,40) are determined by controlling thickness of the first and the second ring(92,94). A guide baffle plate(50) is installed on the first baffle plate(30).