发明名称 Inductively coupled plasma reactor
摘要 An inductively coupled plasma source with one or more sets of chamber (202a, 202b) compartments divided (completely or partially) by a flat casing (204a, 204b) including encased toroidal ferromagnetic inductors (206, 208) with the induced discharge current passing between the divided sub-chambers in closed loops through passages in such toroidal ferromagnetic inductors (206, 208). The chamber has a gas inlet (222) and an outlet (223) for flowing the working gas mixture.
申请公布号 US2003015965(A1) 申请公布日期 2003.01.23
申请号 US20020204043 申请日期 2002.08.15
申请人 GODYAK VALERY 发明人 GODYAK VALERY
分类号 H01J37/32;(IPC1-7):H01J7/24 主分类号 H01J37/32
代理机构 代理人
主权项
地址