PRE-ALIGNMENT SYSTEM WITH WAFER EDGE EXPOSURE APPARATUS

摘要

PURPOSE: A pre-alignment system with a wafer edge exposure(WEE) apparatus is provided to improve productivity by simultaneously performing an alignment process and an edge exposure process, and to more precisely perform an edge exposure process by using laser as a light source. CONSTITUTION: A rotation axis(10) is prepared. A wafer(20) is placed on a stage installed on the rotation axis. An align sensor aligns the wafer on the stage. An edge exposure apparatus performs an edge exposure process of the wafer. The light source(60) irradiates light to the wafer. A control unit(70) controls the width of the light irradiated from the light source. The edge exposure apparatus includes the light source and the control unit.