发明名称 RUN BOX FOR SEMICONDUCTOR FABRICATION PROCESS
摘要 PURPOSE: A run box for semiconductor fabrication process is provided to prevent the oxidation of a metal deposited on a wafer and a lifting phenomenon of photoresist by exhausting air from the inside of the run box to the outside and preventing the inflow of air from the outside into the inside of the run box. CONSTITUTION: A run box(10) is used for storing a wafer cassette for loading a plurality of wafers(5). The run box(10) is formed with a main body(11) and a cover(15). The main box(11) has a space for receiving the wafer cassette(7). The cover(15) has a packing member(13) for sealing an upper portion of the main body(11). A vacuum hose is inserted into one side of the main body(11) in order to exhaust air of the main body to the outside. A hole(11a) is formed at the one side of the main body(11) in order to inject nitrogen gas into the main body(11). A stopper(17) is inserted into the hole(11a).
申请公布号 KR20030006096(A) 申请公布日期 2003.01.23
申请号 KR20010041657 申请日期 2001.07.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JU, JEONG HWAN
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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