Lithographic projection apparatus, device manufacturing method, device manufactured thereby, and measurement method

摘要

A lithographic projection apparatus includes a first object table configured and arranged to hold a patterning structure capable of patterning a projection beam of radiation according to a desired pattern and a second object table configured and arranged to hold a substrate. A positioning structure is configured and arranged to generate a force so as to move one of the object tables with respect to a projection system during an imaging operation. Processing circuitry is configured and arranged to read from a data storage device a compensation force value that corresponds to a value of a signal representing a position of said object table and to generate a force adjustment signal based on the compensation force value. The positioning structure is further configured and arranged to generate the force according to the force adjustment signal.