SHADOW MASK AND BASE MATERIAL THEREFOR

摘要

A high-definition shadow mask, including a stretched mask, and a base material (1) for a shadow mask, wherein the center line average roughness Ra of the small aperture-side surface is not more than 0.25 mu m, and the center line average roughness Ra of the large aperture-side surface is larger than the center line average roughness Ra of the small aperture-side surface by at least 0.25 mu m and is not larger than 1 mu m.