发明名称 |
Method and apparatus for the deposition of metal nanoclusters and films on a substrate |
摘要 |
A method for forming metallic nanoclusters upon a substrate includes moving the substrate through a deposition chamber at a predetermined uniform velocity and depositing metallic precursor compounds onto the substrate. The metallic precursor compounds are subsequently bombarded with an ultrasonic jet of atomic hydrogen to form the metallic nanoclusters.
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申请公布号 |
US6509067(B2) |
申请公布日期 |
2003.01.21 |
申请号 |
US20010845931 |
申请日期 |
2001.04.30 |
申请人 |
JET PROCESS CORPORATION |
发明人 |
HALPERN BRET L. |
分类号 |
C23C16/44;C23C16/448;C23C16/452;C23C16/455;(IPC1-7):B05D3/10 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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