发明名称 LASER EXPOSING SYSTEM AND PHOTOGRAPHIC PROCESSOR
摘要 PROBLEM TO BE SOLVED: To correct shift of the quantity of light due to temperature variation at a laser generating section. SOLUTION: The laser exposing system comprises a section 16 for detecting the temperature at a laser generating section 101, a correction data memory 15 for storing the ratio data of the quantity of exposing light on a photosensitive material P, which varies as the peak wavelength is shifted due to temperature variation of laser light, in correspondence with the temperature at the laser generating section 101, and a section 17 for regulating the quantity of laser light by taking out correction data from temperature information detected at the temperature detecting section 16. According to the arrangement, variation in the quantity of light due to shift of peak wavelength caused by temperature variation at the laser generating section can be corrected.
申请公布号 JP2003019825(A) 申请公布日期 2003.01.21
申请号 JP20010205821 申请日期 2001.07.06
申请人 NORITSU KOKI CO LTD 发明人 ISHII TOMOYUKI
分类号 B41J2/44;G03B27/32;G03B27/72;H04N1/23;H04N1/407;H04N1/46;H04N1/60;(IPC1-7):B41J2/44 主分类号 B41J2/44
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