发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus having a supporting mechanism part whereto a reaction tube can be attached and detached by using a simple mechanism. SOLUTION: In a substrate processing device having a reaction tube 18 and an airtight chamber 8 below the reaction tube, the reaction tube is attached to the airtight chamber via a flange 15. The flange can be attached and detached to the airtight chamber. An inner diameter D2 of an attaching port 36 to the airtight chamber of the flange is larger than a maximum diameter D1 of the reaction tube. The reaction tube is made movable downward inside the airtight chamber, with the flange being detached from the airtight chamber.
申请公布号 JP2003017427(A) 申请公布日期 2003.01.17
申请号 JP20010196402 申请日期 2001.06.28
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YAMAMOTO TETSUO;TANIYAMA TOMOSHI
分类号 H01L21/22;H01L21/205;(IPC1-7):H01L21/22 主分类号 H01L21/22
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