发明名称 METHOD OF ROUGHENING SURFACE OF SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method by which recessed and projecting sections can be formed efficiently in a short time on the surface of a substrate, particularly, a substrate used for solar batteries. SOLUTION: In this method, the surface of a silicon substrate is roughened by dry etching. The drying etching is performed by covering the surface of the silicon substrate with a plate member through which many openings 4a are formed evenly.</p>
申请公布号 JP2003017725(A) 申请公布日期 2003.01.17
申请号 JP20010298671 申请日期 2001.09.27
申请人 KYOCERA CORP 发明人 INOMATA YOSUKE;SHIROMA HIDEKI
分类号 C23F4/00;H01L31/04;(IPC1-7):H01L31/04 主分类号 C23F4/00
代理机构 代理人
主权项
地址