| 摘要 |
PROBLEM TO BE SOLVED: To prevent generation of watermarks during drying treatment in substrate treatment apparatus, and to provide a method for rotating and drying a substrate being rinsed by rinsing liquid such as pure water. SOLUTION: The substrate treatment apparatus includes a substrate-retaining means 1 for retaining a substrate W, a rotary drive means 2 for rotating and driving the substrate-retaining means 1, a supply means 332 for supplying the rinsing liquid toward the upper surface of the substrate W retained by the substrate-retaining means 1, and a control means for controlling the rotary drive and supply means 2 and 332. In the control means, the rinsing liquid is supplied to the upper surface of the substrate W from the supply means 332, to form the liquid film of the rinsing liquid over the entire upper surface of the substrate W.
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