发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce the ON resistance and switching loss of a vertical MOSFET. SOLUTION: A semiconductor device is provided with a semiconductor substrate, a plurality of vertical field effect transistor cells formed in a parallelly connected state on the semiconductor substrate, a gate potential power feed part provided on the surface of the semiconductor substrate, first gate wiring provided on the semiconductor substrate and electrically connected to the gate potential power feed part, and second gate wiring provided on the semiconductor substrate electrically connected to the first gate wiring and also connected to the gate electrodes of the respective transistor cells. The second gate wiring is extended from the first gate wiring and is provided with a tip. Also, the adjacently extended ones of the second gate wiring are extended from the first gate wiring so as to turn a current flowing direction to mutually opposite directions.
申请公布号 JP2003017697(A) 申请公布日期 2003.01.17
申请号 JP20010201804 申请日期 2001.07.03
申请人 HITACHI LTD 发明人 MATSUURA NOBUYOSHI;MIYAGUCHI YASUYUKI;HAYASHI HATSUO;KOYANO MASAFUMI
分类号 H01L21/28;H01L21/3205;H01L21/822;H01L23/52;H01L27/04;H01L29/739;H01L29/78 主分类号 H01L21/28
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