发明名称 METHOD FOR MANUFACTURING PHOTOSENSITIVE RESIN PRINTING PLATE, AND DEVELOPER TREATMENT DEVICE
摘要 <p>A method for manufacturing a photosensitive resin plate comprising an exposure step (1) of forming a latent image on a photosensitive resin layer by irradiating active beam on a plate having a water-developable photosensitive resin layer, a developing step (2) of forming a relief image from the latent image by dissolving or dispersing the photosensitive resin layer with the latent image formed thereon in developer mainly consisting of water, and a drying step (3) of removing the developer from the plate with the relief image formed thereon. The photosensitive resin layer component generated in the developing step is recycled as photosensitive resin by performing vacuum distillation of the dissolved or dispersed developer, and residues by the vacuum distillation are solidified. A treatment device of the developer containing the photosensitive resin layer component for the photosensitive resin printing plate comprising a vaporizer for evacuating the developer and a cooler for condensing and collecting the vaporized developer, and further comprising an attachable/detachable internal container in the vaporizer. The developer generated by the development of the photosensitive resin printing plate, in particular, the water-developable photosensitive resin plate can be recycled without reducing the developing speed or generating coagulation of the photosensitive resin layer component.</p>
申请公布号 WO2003005129(P1) 申请公布日期 2003.01.16
申请号 JP2002006695 申请日期 2002.07.02
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