发明名称 PROCESSING SYSTEM AND CLEANING METHOD
摘要 <p>A processing system capable of performing dry cleaning by leading cleaning gas activated by plasma in an activator (110) into a processing chamber (101), wherein exhaust gas from the processing chamber (101) passes through a circulation line (128), is slowed down by a cryotrap (115) formed of a temperature trap utilizing a difference in steam pressure, and is re-used for cleaning.</p>
申请公布号 WO2003005427(P1) 申请公布日期 2003.01.16
申请号 JP2002006734 申请日期 2002.07.03
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