| 摘要 |
PROBLEM TO BE SOLVED: To provide an analytical method for trace impurities in high-purity fluorine gas in which a contamination from a metal material coming into contact with the fluorine gas or from a fluorine gas separator is suppressed. SOLUTION: A process (1) wherein a fluoronickel compound is filled into a container in which a fluoride layer is formed on the surface, the fluoronickel compound is heated to 250 to 600 deg.C and a pressure inside the container is decreased to 0.01 MPa (absolute pressure) or less and a process (2) wherein the fluoronickel compound passed through the process (1) occuludes the fluorine gas whose content of hydrogen fluoride is reduced to 500 vol ppm or less are performed at least once. In addition, the process (1) is performed, the fluorine gas containing a impurity gas is brought into contact with the fluoronickel compound at 250 to 350 deg.C, and the fluorine gas is immobilized and removed as to be analyzed by a gas chromatograph.
|
