| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing liquid supply device and a method therefor capable of maintaining density and a degree of dispersion of polishing powders in polishing liquid supplied to a polishing device in a desired condition. SOLUTION: This polishing liquid supply device has a storage part for storing polishing liquid containing polishing powders as abrasive, a stirring part for stirring the polishing liquid in the storage part, a dispersion part provided in the storage part to disperse the polishing powders by applying a mechanical force to the polishing liquid, and a supply part for supplying the polishing liquid after passing the dispersion part to the polishing device. |
