发明名称 Semiconductor device and method of making
摘要 A semiconductor device (10) is formed that is bi-lateral and has a voltage blocking capability that is well suited to applications involving portable electronics. The semiconductor device has an epitaxial layer (14) that is formed on a semiconductor substrate (11). A doped region (24) is formed that extends from a top surface (16) of the epitaxial layer (14) to the underlying semiconductor substrate (11). The semiconductor device (10) has a source region (31) that is separated from the doped region (24) to provide a channel region (29). The channel region (29) is modulated by a gate structure (20) to determine if a current flow should be allowed through semiconductor device (10) or if semiconductor device (10) is to provide voltage blocking capability.
申请公布号 US6507070(B1) 申请公布日期 2003.01.14
申请号 US19960755926 申请日期 1996.11.25
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES LLC 发明人 SHEN ZHENG;ROBB STEPHEN P.;MITTER CHANG SU
分类号 H01L29/08;H01L29/167;H01L29/417;H01L29/78;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113 主分类号 H01L29/08
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