| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus that can prevent abnormal discharge for uniform etching in the plasma treatment of a silicon-based substrate. SOLUTION: As the material of an electrode member 17 for a plasma treatment apparatus, fitted onto the front of a gas supply port of an electrode for plasma generation in the plasma treatment apparatus, a ceramic porous body having three-dimensional mesh structure where a skeleton section 18a of ceramic containing alumina is allowed to continue in a three-dimensional mesh shape is used, and gas for plasma generation is made to pass through via a void section 18b being formed in the three-dimensional mesh structure irregularly, thus making uniform the distribution of the gas to be supplied for preventing abnormal discharge, and achieving uniform etching without variation. |
