发明名称 APPARATUS AND METHODS FOR MONITORING SELF-ALIGNED CONTACT ARRAYS
摘要 Disclosed are methods and apparatus for detecting defects in a partially fabricated semiconductor device with self-aligned contacts. The self-aligned contacts are formed from a first layer with a plurality of contact portions, a second layer with a plurality of conductive lines that are each aligned proximate to an associated underlying contact portion, and a third insulating layer formed over the conductive lines and their proximate underlying contact portions. The third insulating layer has a plurality of vias formed therein that are each formed alongside a one of the conductive lines and over its proximate underlying contact portion. A charged particle beam is scanned over a portion of the vias to form a voltage contrast image of each via. When a minority of the vias in the image have a significantly different brightness level than a majority of the vias, it is then determined that the minority of vias have defects.
申请公布号 WO03003375(A2) 申请公布日期 2003.01.09
申请号 WO2002US20205 申请日期 2002.06.25
申请人 KLA-TENCOR CORPORATION 发明人 WEINER, KURT, H.;NUNAN, PETER, D.;TANDON, SANJAY
分类号 G01R31/28;G01R31/307 主分类号 G01R31/28
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