发明名称 |
APPARATUS AND METHODS FOR MONITORING SELF-ALIGNED CONTACT ARRAYS |
摘要 |
Disclosed are methods and apparatus for detecting defects in a partially fabricated semiconductor device with self-aligned contacts. The self-aligned contacts are formed from a first layer with a plurality of contact portions, a second layer with a plurality of conductive lines that are each aligned proximate to an associated underlying contact portion, and a third insulating layer formed over the conductive lines and their proximate underlying contact portions. The third insulating layer has a plurality of vias formed therein that are each formed alongside a one of the conductive lines and over its proximate underlying contact portion. A charged particle beam is scanned over a portion of the vias to form a voltage contrast image of each via. When a minority of the vias in the image have a significantly different brightness level than a majority of the vias, it is then determined that the minority of vias have defects. |
申请公布号 |
WO03003375(A2) |
申请公布日期 |
2003.01.09 |
申请号 |
WO2002US20205 |
申请日期 |
2002.06.25 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
WEINER, KURT, H.;NUNAN, PETER, D.;TANDON, SANJAY |
分类号 |
G01R31/28;G01R31/307 |
主分类号 |
G01R31/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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