发明名称 RETICLE USING ASYMMETRIC OVERLAPPING MARK
摘要 PURPOSE: A reticle using an asymmetric overlapping mark is provided to easily sense a reverse-loading of the reticle by using the asymmetric overlapping mark. CONSTITUTION: A reticle comprises a plurality of symmetric overlapping marks(11,12,13,14) formed on a scribe line. The reticle further includes an asymmetric overlapping mark(24) for sensing a reverse-loading of the reticle. Also, the location of the symmetric overlapping marks(11,12,13,14) is asymmetrically different from the location of the asymmetric overlapping mark(24). The difference of the location between the symmetric overlapping mark(14) and the asymmetric overlapping mark(24) is about 1 micrometer.
申请公布号 KR20030002231(A) 申请公布日期 2003.01.08
申请号 KR20010038995 申请日期 2001.06.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, HUI MOK
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址