| 摘要 |
PROBLEM TO BE SOLVED: To provide a composite material uniform even in a local region, reduced in the content of an impurity component other than a metal seed being a target component, continuously reduced in flaw from its surface including a different kind of a metal interface to its bottom surface and particularly suitable as a target material of dry process vapor deposition, and a method for manufacturing the same. SOLUTION: Two or more kinds of metal foils comprising Al, Ti or the like are bonded by discharge plasma diffusion bonding or the like to form the composite material having a fine layered structure wherein two or more kinds of metal seeds are repeated regularly. The composite material is used as the target material to perform dry process vapor deposition such as a reactive sputtering method or the like to obtain a product such as a cutting tool, a slide part or the like coated with a hard thin film excellent in abrasion resistance or oxidation resistance.
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