| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to regulate the temps. of respective processing liquids to respective desired set temps. by devising temp. control and to reduce the cost and running cost of an apparatus. SOLUTION: A processing control section rotationally drives a first substrate at a first number ra1 of revolutions, holds the substrate for the holding time TA1 and supplies a photoresist liquid for the holding time TB1 from a processing discharge nozzle at the point of the time the supply start time TS1 elapses after the completion of carrying-in. This processing control section outputs a 'supply completion signal' to a temp. control section when the holding time TB1 elapses. The temp. control section, upon receipt of this signal, starts regulating the temp. to the set temp. TP2 of the photoresist liquid to be supplied to the second substrate. |
